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Semiconductor Sample Preparation for Atom Probe Tomography
Atom probe tomography sample preparation
Advances in semiconductor design mean smaller and more complex architectures are used in the manufacturing process. Atom probe tomography is used in characterizing these architectures, as it enables accurate visualization and analysis at high resolution.
However, in order to precisely characterize samples using atom probe tomography, clean and uniform sample preparation is necessary. This is difficult to achieve using current high kV cleaning methods, because these techniques damage the sample surface.
This also makes automation of sample processing a key challenge because additional cleaning steps are needed. While these steps may be suitable for single samples, they make bulk sample preparation time consuming. As a result, an automated procedure is needed to optimize productivity.
Register now for this webinar and learn about a unique low kV cleaning method using the Thermo Scientific Helios 5. This technique automates sample preparation for atom probe tomography and increases productivity for failure analysis lab managers and engineers, which allows them to process more samples in a 24-hour period. It also offers the ability to precisely control sample depth to provide clean samples for analysis.
Who should attend this webinar
Semiconductor and NAND Failure Analysis lab managers and engineers.
What will you learn in this webinar
- Learn about a precise, low kV cleaning process for atom probe tomography – a method that delivers clean, high quality samples, as well as better depth control to reach the region of interest (ROI).
- Learn how this process can automate atom probe tomography sample preparation, increasing productivity for users.
About the Semiconductor SPARK Webinar Series
SPARK is a collaborative knowledge platform where semiconductor professionals and industry thought leaders can come together to share actionable semiconductor and microelectronics insights, provide their perspective on tool performance and best practices, and gain visibility to state-of-the-art solutions.
About the speaker:
Woo Jun (WJ) Kwon, Field Application Engineer, Thermo Fisher Scientific
Woo Jun (WJ) Kwon is a Field Application Engineer at Thermo Fisher Scientific in Korea. WJ has eight years of experience with small dual beam and wafer dual beam applications for semiconductor manufacturing. Over the last few years, WJ has played a lead role in developing APT (Atom Probe Tomography) sample preparation applications. WJ received his Master’s degree in Physics from Kookmin University.