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Semiconductor metrology and analysis

To meet tomorrow’s performance and power efficiency needs, the semiconductor industry continues to innovate and push technology boundaries.

For more than four decades, semiconductor researchers, designers, and manufacturers have counted on Thermo Fisher Scientific to provide failure analysis, metrology, and characterization solutions.

Learn how Thermo Fisher Scientific is helping create tomorrow’s logic, memory, power, display devices, and more.

 Download our fact sheet to learn more ›






Semiconductor metrology, characterization, and failure analysis solutions


From research and development to high-volume manufacturing and beyond, Thermo Fisher Scientific offers a broad portfolio of solutions and workflows to support semiconductor development and accelerate time-to-market.

Semiconductor Device Packaging

Semiconductor Advanced Packaging

Performance, power efficiency, area, and cost are driving packaging innovations. Learn how workflows provide fast, precise, and accurate time-to-data.

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Semiconductor Memory Devices

Data demands are driving 3D NAND, DRAM and other memory structure innovations. Learn how analysis tools and workflows offer accurate visibility of buried features and defects.

Semiconductor power devices

Semiconductor power devices

Novel architectures and materials pose new challenges. Learn how to pinpoint faults and characterize materials, structures, and interfaces.

Display Module Failure Analysis

Semiconductor display technology

Display technologies are evolving to improve display quality and light conversion efficiency. Learn how metrology, failure analysis, and characterization solutions provide insights.

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Semiconductor research and development

Innovation starts with research and development. Learn more about solutions to help you understand innovative structures and materials at the atomic level.

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Semiconductor materials characterization

Many factors impact yield, performance, and reliability. Learn more about solutions to characterize physical, structural, and chemical properties.

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Semiconductor metrology

Manufacturing today’s complex semiconductors requires exact process controls. Learn more about advanced metrology and analysis solutions to accelerate yield learnings.

Semiconductor Failure Analysis

Semiconductor Failure Analysis

Complex semiconductor device structures result in more places for defects to hide. Learn more about failure analysis solutions to isolate, analyze, and repair defects.

Chemical Structure and Composition Analysis

Chemical Structure and Composition Analysis

From incoming raw materials through fabrication and QA/QC, vibrational spectroscopy techniques provide detailed information about the chemical composition, molecular structure, and crystal orientation of the materials.

Ultra-High Purity Gas Analysis

Ultra-High Purity Gas Analysis

Impure gas can lead to poor device performance, production delays and revenue loss. Learn how you can continuously measure bulk gases with more accurate analysis and lower detection limits than any other technologies.

Semiconductor Advanced Logic Transistor Analysis

Semiconductor Advanced Logic Transistor Analysis

Advanced logic manufacturers are introducing new metrology, defect analysis, and failure analysis challenges with the transition to gate-all-around transistor. Our industry-recognized solutions let you accurately root cause, measure, and characterize yield-limiting defects to accelerate yield learning cycles, improve production yield, and enhance device performance.


Resources for semiconductor characterization, failure analysis, and metrology

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Semiconductor Leaning Center

The content you will find contains information on new techniques and workflows to provide you with accurate and reliable insights and capabilities to assist in accelerating semiconductor design, analysis and production. Via the learning center you will be able to access application notes, videos, webinars, white papers and blogs.

Learn more

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SPARK Webinars

SPARK is a knowledge community where semiconductor professionals and industry thought leaders come together to share information on failure analysis, metrology and characterization techniques. Our webinars highlight the latest advances in semiconductor analysis, enabling you to stay at the forefront of an evolving technology and application landscape.

View webinars

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Illuminating Semiconductors

Semiconductor manufacturing stories and solutions about a more connected, more autonomous, and smarter world.

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Videos

The Thermo Scientific Helios DualBeam Family

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Techniques

TEM Metrology

Advanced and automated TEM metrology routines deliver significantly greater precision than manual methods. This allows users to generate large amounts of statistically relevant data, with sub-angstrom-level specificity, that is free of operator bias.

Learn more ›

Semiconductor TEM Imaging and Analysis

Thermo Scientific transmission electron microscopes offer high-resolution imaging and analysis of semiconductor devices, enabling manufacturers to calibrate toolsets, diagnose failure mechanisms, and optimize overall process yields.

Learn more ›

Circuit Edit

Advanced, dedicated circuit edit and nanoprototyping solutions, which combine novel gas-delivery systems with a broad portfolio of chemistries and focused ion beam technology, offer unparalleled control and precision for semiconductor device development.

Learn more ›

SEM Metrology

Scanning electron microscopy provides accurate and reliable metrology data at nanometer scales. Automated ultra-high-resolution SEM metrology enables faster time-to-yield and time-to-market for memory, logic, and data storage applications.

Learn more ›

Semiconductor Analysis and Imaging

Thermo Fisher Scientific offers scanning electron microscopes for every function of a semiconductor lab, from general imaging tasks to advanced failure analysis techniques requiring precise voltage-contrast measurements.

Learn more ›

Optical Fault Isolation

Increasingly complex designs complicate fault and defect isolation in semiconductor manufacturing. Optical fault isolation techniques allow you to analyze the performance of electrically active devices to locate critical defects that cause device failure.

Learn more ›

Thermal Fault Isolation

Uneven distribution of local power dissipation can cause large, localized increases in temperature, leading to device failure. We offer unique solutions for thermal fault isolation with high-sensitivity lock-in infrared thermography (LIT).

Learn more ›

Sample Preparation of Semiconductor Devices

Thermo Scientific DualBeam systems provide accurate TEM sample preparation for atomic-scale analysis of semiconductor devices. Automation and advanced machine learning technologies produce high-quality samples, at the correct location, and a low cost per sample.

Learn more ›

Nanoprobing

As device complexity increases, so does the number of places defects have to hide. Nanoprobing provides the precise localization of electrical faults, which is critical for an effective transmission electron microscopy failure analysis workflow.

Learn more ›

APT Sample Preparation

Atom probe tomography (APT) provides atomic-resolution 3D compositional analysis of materials. Focused ion beam (FIB) microscopy is an essential technique for high-quality, orientation, and site-specific sample preparation for APT characterization.

Learn more ›

Semiconductor Laser Ablation

Laser ablation provides high-throughput milling of semiconductor devices for imaging and analysis with electron microscopy, while still preserving sample integrity. Access large-volume 3D data and optimize milling conditions to best suit your sample type.

Learn more ›

Device Delayering

Shrinking feature size, along with advanced design and architecture, results in increasingly challenging failure analysis for semiconductors. Damage-free delayering of devices is a critical technique for the detection of buried electrical faults and failures.

Learn more ›

ESD Compliance Testing

Electrostatic discharge (ESD) can damage small features and structures in semiconductors and integrated circuits. We offer a comprehensive suite of test equipment which verifies that your devices meet targeted ESD compliance standards.

Learn more ›

Atmospheric Pressure Ionization Mass Spectrometry (API-MS)

Perform routine continuous measurement of contaminants including water and oxygen to single-digit ppt levels. These gas analyzers offer a cost effective alternative to conventional quality control techniques allowing each bulk gas to be monitored for a range of potential contaminants, while achieving lower detection limits (up to 100 times better) than any other technology.

Learn more 

TEM Metrology

Advanced and automated TEM metrology routines deliver significantly greater precision than manual methods. This allows users to generate large amounts of statistically relevant data, with sub-angstrom-level specificity, that is free of operator bias.

Learn more ›

Semiconductor TEM Imaging and Analysis

Thermo Scientific transmission electron microscopes offer high-resolution imaging and analysis of semiconductor devices, enabling manufacturers to calibrate toolsets, diagnose failure mechanisms, and optimize overall process yields.

Learn more ›

Circuit Edit

Advanced, dedicated circuit edit and nanoprototyping solutions, which combine novel gas-delivery systems with a broad portfolio of chemistries and focused ion beam technology, offer unparalleled control and precision for semiconductor device development.

Learn more ›

SEM Metrology

Scanning electron microscopy provides accurate and reliable metrology data at nanometer scales. Automated ultra-high-resolution SEM metrology enables faster time-to-yield and time-to-market for memory, logic, and data storage applications.

Learn more ›

Semiconductor Analysis and Imaging

Thermo Fisher Scientific offers scanning electron microscopes for every function of a semiconductor lab, from general imaging tasks to advanced failure analysis techniques requiring precise voltage-contrast measurements.

Learn more ›

Optical Fault Isolation

Increasingly complex designs complicate fault and defect isolation in semiconductor manufacturing. Optical fault isolation techniques allow you to analyze the performance of electrically active devices to locate critical defects that cause device failure.

Learn more ›

Thermal Fault Isolation

Uneven distribution of local power dissipation can cause large, localized increases in temperature, leading to device failure. We offer unique solutions for thermal fault isolation with high-sensitivity lock-in infrared thermography (LIT).

Learn more ›

Sample Preparation of Semiconductor Devices

Thermo Scientific DualBeam systems provide accurate TEM sample preparation for atomic-scale analysis of semiconductor devices. Automation and advanced machine learning technologies produce high-quality samples, at the correct location, and a low cost per sample.

Learn more ›

Nanoprobing

As device complexity increases, so does the number of places defects have to hide. Nanoprobing provides the precise localization of electrical faults, which is critical for an effective transmission electron microscopy failure analysis workflow.

Learn more ›

APT Sample Preparation

Atom probe tomography (APT) provides atomic-resolution 3D compositional analysis of materials. Focused ion beam (FIB) microscopy is an essential technique for high-quality, orientation, and site-specific sample preparation for APT characterization.

Learn more ›

Semiconductor Laser Ablation

Laser ablation provides high-throughput milling of semiconductor devices for imaging and analysis with electron microscopy, while still preserving sample integrity. Access large-volume 3D data and optimize milling conditions to best suit your sample type.

Learn more ›

Device Delayering

Shrinking feature size, along with advanced design and architecture, results in increasingly challenging failure analysis for semiconductors. Damage-free delayering of devices is a critical technique for the detection of buried electrical faults and failures.

Learn more ›

ESD Compliance Testing

Electrostatic discharge (ESD) can damage small features and structures in semiconductors and integrated circuits. We offer a comprehensive suite of test equipment which verifies that your devices meet targeted ESD compliance standards.

Learn more ›

Atmospheric Pressure Ionization Mass Spectrometry (API-MS)

Perform routine continuous measurement of contaminants including water and oxygen to single-digit ppt levels. These gas analyzers offer a cost effective alternative to conventional quality control techniques allowing each bulk gas to be monitored for a range of potential contaminants, while achieving lower detection limits (up to 100 times better) than any other technology.

Learn more 

Products

Helios 6 HD FIB-SEM

  • High-volume TEM sample prep
  • Maximized system utilization
  • Failure analysis and metrology

Helios 5 HX/Helios 5 UX/Helios 5 FX DualBeam

  • Fully automated, high-quality, ultra-thin TEM sample preparation
  • High throughput, high resolution subsurface and 3D characterization
  • Rapid nanoprototyping capabilities

Helios 5 PFIB DualBeam

  • Gallium-free STEM and TEM sample preparation
  • Multi-modal subsurface and 3D information
  • Next-generation 2.5 μA xenon plasma FIB column

Helios 5 Laser PFIB System

  • Fast, millimeter-scale cross sections
  • Statistically relevant deep subsurface and 3D data analysis
  • Shares all capabilities of the Helios 5 PFIB platform
Thermo Scientific Helios Hydra plasma focused ion beam scanning electron microscope (DualBeam)

Helios Hydra DualBeam

  • 4 fast switchable ion species (Xe, Ar, O, N) for optimized PFIB processing of a widest range of materials
  • Ga-free TEM sample preparation
  • Extreme high resolution SEM imaging

Helios 5 EXL DualBeam

  • Low-voltage performance for high sample preparation quality
  • Ultra-high-resolution immersion-lens field-emission SEM column
  • Automated handling of 300 mm FOUP with EFEM (GEM300 compliant)

Helios 5 PXL PFIB Wafer DualBeam

  • PFIB beam current from 1pA–2.6µA
  • Faster yield learning and increased productivity
  • Automated handling of 300 mm FOUP with EFEM (GEM300 compliant
Thermo Scientific Scios 2 plasma focused ion beam scanning electron microscope (DualBeam)

Scios 2 DualBeam

  • Full support of magnetic and non-conductive samples
  • High throughput subsurface and 3D characterization
  • Advanced ease of use and automation capabilities

Metrios 6 (S)TEM

  • Fully Automating Semiconductor Metrology Workflows
  • Recipe-Free Automation for (S)TEM Metrology
  • Efficient Chemical Analysis

Metrios AX TEM

  • Automation options to support quality, consistency, metrology, and reduced OPEX
  • Leverages machine learning for superior autofunctions and feature recognition
  • Workflows for both in-situ and ex-situ lamella preparation

Spectra Ultra

  • New imaging and spectroscopy capabilities on the most beam sensitive materials
  • A leap forward in EDX detection with Ultra-X
  • Column designed to maintain sample integrity.

Spectra 300

  • Highest-resolution structural and chemical information at the atomic level
  • Flexible high-tension range from 30-300 kV
  • Three lens condenser system

Talos F200E TEM

  • High-quality (S)TEM imaging of semiconductor and microelectronic devices
  • Precise, high-speed chemical characterization with EDS
  • Dedicated semiconductor-related applications
Thermo Scientific Apreo 2 scanning electron microscope (SEM)

Apreo 2 SEM

  • High-performance SEM for all-round nanometer or sub-nanometer resolution
  • In-column T1 backscatter detector for sensitive, TV-rate materials contrast
  • Excellent performance at long working distance (10 mm)

Phenom ProX G6 Desktop SEM

  • High performance desktop SEM with integrated EDS detector
  • Resolution <6 nm (SE) and <8 nm (BSE); magnification up to 350,000x
  • Optional SE detector

Axia ChemiSEM

  • Live quantitative elemental mapping
  • High fidelity scanning electron microscopy imaging
  • Flexible and easy to use, even for novice users
  • Easy maintenance
Thermo Scientific Verios 5 XHR scanning electron microscope (SEM)

Verios 5 XHR SEM

  • Monochromated SEM for sub-nanometer resolution over the full 1 keV to 30 keV energy range
  • Easy access to beam landing energies as low as 20 eV
  • Excellent stability with piezo stage as standard

ELITE System

  • Electrical defect localization
  • Thermal mapping
  • Advanced packaging analysis

Hyperion II System

  • Atomic Force Probing
  • Localize transistor faults
  • Integrated PicoCurrent (CAFM)

Meridian S System

  • Fault Diagnostic with Active Probe Technology
  • Static laser stimulation (SLS / OBIRCH) and photon emission options
  • Supports both micro-probing and probe card device stimulation

Meridian WS-DP System

  • High-sensitivity, low-noise, low-voltage photon emission detection with broadband DBX or InGaAs camera systems
  • Multi-wavelength laser scanning microscope for scan chain analysis, frequency mapping, transistor probing and isolation of faults

Meridian IV System

  • High sensitivity extended-wavelength DBX photon emission detection
  • Standard InGaAs photon emission detection
  • Laser Scanning Microscope with multiple wavelength options

Meridian 7 System

  • Dynamic Optical Fault Isolation for 10nm node and below
  • High resolution visible and Infrared light
  • High-yield sample preparation to 5μm widely available

Meridian EX System

  • Novel electron beam probing
  • 10× resolution versus optical
  • <5 nm node defect localization

nProber IV

  • Localize transistor and BEOL faults
  • Thermal nanoprobing (-40°C to 150°C)
  • Semi-automated operation

Centrios HX Circuit Edit System

  • Cutting-edge circuit editing for sub 7nm advanced semiconductor
  • Unparalleled milling precision and control with low landing energy
  • Advanced navigation and ion beam placement accuracy

Centrios CE

  • High-performance circuit editing for 14-nm and above design rules
  • Superior milling precision and control
  • Advanced navigation and ion beam placement accuracy

MK.4TE ESD and Latch-Up Test System

  • Rapid-relay-based operations—up to 2304 channels
  • Advanced device preconditioning with six separate vector drive levels
  • Fully compliant Latch-Up stimulus and device biasing

Orion3 Test System

  • Charged device model testing
  • Dual high resolution color cameras
  • Test densities to less than 0.4mm pitch

Celestron Test System

  • Wafer and package level TLP testing
  • High current TLP pulse generator
  • Can be interfaced with semiautomatic probers
  • Intuitive software for control and report generation

Pegasus

  • Testing per the latest industry standards
  • True system level ESD 150pF/330Ω network
  • 2 pin connection via wafer probes to any device

AutoTEM 5

  • Fully automated in situ S/TEM sample preparation
  • Support of top-down, planar and inverted geometry
  • Highly configurable workflow
  • Easy to use, intuitive user interface
Thermo Scientific Auto Slice and View 4.0 serial section electron microscopy software

Auto Slice and View 4.0 Software

  • Automated serial sectioning for DualBeam
  • Multi-modal data acquisition (SEM, EDS, EBSD)
  • On-the-fly editing capabilities
  • Edge based cut placement
Thermo Scientific Maps electron microscopy software

Maps Software

  • Acquire high-resolution images over large areas
  • Easily find regions of interest
  • Automate image acquisition process
  • Correlate data from different sources

Avizo Software
Materials Science

  • Support for multi-data/multi-view, multi-channel, time series, very large data
  • Advanced multi-mode 2D/3D automatic registration
  • Artifact reduction algorithms

iFast Software

  • Macro recorder for faster recipe creating
  • Runner for unattended overnight operation
  • Alignment tools: Image recognition and edge finding
Thermo Scientific Inspect 3D tomography software

Inspect 3D Software

  • Image processing tools and filters for cross-correlation
  • Feature tracking for image alignment
  • Algebraic reconstruction technique for iterative projection comparison

NEXS Software

  • Auto-syncs position/magnification between NEXS and Circuit Edit system for a more seamless user experience
  • Connects to most Thermo Scientific tools used for EFA, PFA and Circuit Edit space

AutoScript 4

  • Improved reproducibility and accuracy
  • Unattended, high throughput imaging and patterning
  • Supported by Python 3.5-based scripting environment

APIX/APIMS δQ and APIX/APIMS Quattro™

  • Reliable, fully automatic system
  • Superior sensitivity with lower detection capability
  • Automated sample stream switching and calibration
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Electron microscopy services for
semiconductors

To ensure optimal system performance, we provide you access to a world-class network of field service experts, technical support, and certified spare parts.

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