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Thermo Scientific NEXS Software goes far beyond a CAD viewer and stage driver by facilitating fault isolation, failure analysis, sample preparation and circuit edit. NEXS Software enables diverse workflows by providing CAD connectivity with Thermo Scientific analytical equipment.
NEXS Software directly reads/displays the mask data and drives the system stage accurately to fault or edit locations.
- Reads/displays GDS2 and OASIS mask data
- Creates cache database for faster re-load, rendering and tracing (GDS only)
- Connects to most Thermo Scientific tools used for EFA, PFA and Circuit Edit space
- Supports overlaying CAD on microscope image
- Auto-syncs position/magnification between NEXS and Circuit Edit system for a more seamless user experience
- Annotates layout, navigates by text location point, and receives marked hotspot locations
- Reads popular box, text and net trace formats (.vl, .dl, .hl)
- Traces/highlights nets and cells
- Reads software diagnostic callouts and scan chains from various formats (.vl, .sigps.txt, query.txt)
Technical specifications
- Windows® 10 – Runs on Thermo Scientific support PC (SPC)
- 64-bit Linux OS – Can run on Linux server farm, network or local server
- RAM and hard drive requirements vary with CAD database sizes
Database file formats supported
- GDS2
- Gnuzip compressed GDS2 (.gz) for Linux only
- OASIS
Thermo Scientific equipment supported
- PFA: Helios, Scios, Apreo, Prisma, Verios, Quattro
- EFA: Meridian, WaferScan, ELITE, nProber
- Circuit Edit: Centrios, Taipan, OptiFIB IV, V400 ACE
Semiconductor Pathfinding and Research
Advanced electron microscopy, focused ion beam, and associated analytical techniques for identifying viable solutions and design methods for the fabrication of high-performance semiconductor devices.
Semiconductor Failure Analysis
Increasingly complex semiconductor device structures result in more places for failure-inducing defects to hide. Our next-generation workflows help you localize and characterize subtle electrical issues that affect yield, performance, and reliability.
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Optical Fault Isolation
Increasingly complex designs complicate fault and defect isolation in semiconductor manufacturing. Optical fault isolation techniques allow you to analyze the performance of electrically active devices to locate critical defects that cause device failure.
Circuit Edit
Advanced, dedicated circuit edit and nanoprototyping solutions, which combine novel gas-delivery systems with a broad portfolio of chemistries and focused ion beam technology, offer unparalleled control and precision for semiconductor device development.
Optical Fault Isolation
Increasingly complex designs complicate fault and defect isolation in semiconductor manufacturing. Optical fault isolation techniques allow you to analyze the performance of electrically active devices to locate critical defects that cause device failure.
Circuit Edit
Advanced, dedicated circuit edit and nanoprototyping solutions, which combine novel gas-delivery systems with a broad portfolio of chemistries and focused ion beam technology, offer unparalleled control and precision for semiconductor device development.
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Electron microscopy services
To ensure optimal system performance, we provide you access to a world-class network of field service experts, technical support, and certified spare parts.
Electron microscopy support and resources
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