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FIB circuit edit and rapid prototyping
Time to market is a critical factor in the success of semiconductor devices. Manufacturing timelines are long and difficult to manage, so it is important that early production runs provide functional devices. Late discovery of design issues limiting device performance at final test can lead to months of delays in product introduction timelines while new mask sets are created, and new devices are manufactured.
Circuit edit systems provide a solution to test and validate design changes, optimize performance, prototype, and scale functional devices for internal and external customer’s development, validation, and qualification. Circuit edit systems utilize high-resolution focused ion beams (FIBs) and advaced chemistries to perform “nano-surgery” on semi-conductor devices, cutting and creating connections within the device to correct design issues and return functioning products. These working devices keep projects on track without the costs and delays of new mask sets.
Circuit edit systems
With the Thermo Scientific Centrios and Centrios HX Circuit Edit Systems, you can manage program costs, avoid schedule delays, and accelerate time-to-market. The Centrios HX System is designed to meet the circuit editing needs of today’s most advanced semiconductor devices. The Centrios System provides circuit edit capability suitable for a wide range of applications where the required circuit edit performance can be delivered with an improved cost of ownership. Both systems are optimized for the modern, competitive technology world.
Circuit edit and semiconductor prototyping workflow
High-resolution focused ion beam milling opens a low-level metal layer with precision and control.
Our instrumentation offers superior contrast with a high signal-to-noise ratio, even at low-kV, revealing active areas of interest while minimizing damage.
The innovative Dual MultiChem Gas Delivery System enables repeatable, precise, and uniform process control.
Planar large-area delayering with unique chemistry performed using the Dual MultiChem Gas Delivery System.
Fundamentals of Circuit Edit eBook
While circuit editing is a well-established technique, it can be especially difficult for those who are new to it. To help you get started, we asked our circuit edit customers what they wish they had known when they started doing FIB circuit edit and collected their feedback, as well as input from our team of experts, in our new eBook: Fundamentals of Circuit Edit. The eBook includes:
- A definition of circuit edit
- An overview of focused ion beams
- Circuit edit tips from experienced practitioners
- Descriptions of key circuit edit tools and solutions
High-resolution focused ion beam milling opens a low-level metal layer with precision and control.
Our instrumentation offers superior contrast with a high signal-to-noise ratio, even at low-kV, revealing active areas of interest while minimizing damage.
The innovative Dual MultiChem Gas Delivery System enables repeatable, precise, and uniform process control.
Planar large-area delayering with unique chemistry performed using the Dual MultiChem Gas Delivery System.
Fundamentals of Circuit Edit eBook
While circuit editing is a well-established technique, it can be especially difficult for those who are new to it. To help you get started, we asked our circuit edit customers what they wish they had known when they started doing FIB circuit edit and collected their feedback, as well as input from our team of experts, in our new eBook: Fundamentals of Circuit Edit. The eBook includes:
- A definition of circuit edit
- An overview of focused ion beams
- Circuit edit tips from experienced practitioners
- Descriptions of key circuit edit tools and solutions
Semiconductor Pathfinding and Research
Advanced electron microscopy, focused ion beam, and associated analytical techniques for identifying viable solutions and design methods for the fabrication of high-performance semiconductor devices.
Yield Ramp and Metrology
We offer advanced analytical capabilities for defect analysis, metrology, and process control, designed to help increase productivity and improve yield across a range of semiconductor applications and devices.
Power Semiconductor Device Analysis
Power devices pose unique challenges for localizing faults, primarily as a result of power device architecture and layout. Our power device analysis tools and workflows quickly pinpoint fault locations at operating conditions and provide precise, high-throughput analysis for characterization of materials, interfaces and device structures.
Semiconductor Materials and Device Characterization
As semiconductor devices shrink and become more complex, new designs and structures are needed. High-productivity 3D analysis workflows can shorten device development time, maximize yield, and ensure that devices meet the future needs of the industry.
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Electron microscopy services for
semiconductors
To ensure optimal system performance, we provide you access to a world-class network of field service experts, technical support, and certified spare parts.
