Thermo Scientific NEXS Software goes far beyond a CAD viewer and stage driver by facilitating fault isolation, failure analysis, sample preparation and circuit edit. NEXS Software enables diverse workflows by providing CAD connectivity with Thermo Scientific analytical equipment.

NEXS Software directly reads/displays the mask data and drives the system stage accurately to fault or edit locations.

 


Key Features

  • Reads/displays GDS2 and OASIS mask data
  • Creates cache database for faster re-load, rendering and tracing (GDS only)
  • Connects to most Thermo Scientific tools used for EFA, PFA and Circuit Edit space
  • Supports overlaying CAD on microscope image
  • Auto-syncs position/magnification between NEXS and Circuit Edit system for a more seamless user experience
  • Annotates layout, navigates by text location point, and receives marked hotspot locations
  • Reads popular box, text and net trace formats (.vl, .dl, .hl)
  • Traces/highlights nets and cells
  • Reads software diagnostic callouts and scan chains from various formats (.vl, .sigps.txt, query.txt)

Specifications

Technical specifications

  • Windows® 10 – Runs on Thermo Scientific support PC (SPC)
  • 64-bit Linux OS – Can run on Linux server farm, network or local server
  • RAM and hard drive requirements vary with CAD database sizes

Database file formats supported

  • GDS2
  • Gnuzip compressed GDS2 (.gz) for Linux only
  • OASIS

Thermo Scientific equipment supported

  • PFA: Helios, Scios, Apreo, Prisma, Verios, Quattro
  • EFA: Meridian, WaferScan, ELITE, nProber
  • Circuit Edit: Centrios, Taipan, OptiFIB IV, V400 ACE

 


Applications

半导体寻路

半导体探索和开发

先进的电子显微镜、聚焦离子束和相关半导体分析技术可用于识别制造高性能半导体器件的可行解决方案和设计方法。

半导体故障分析

半导体故障分析

越来越复杂的半导体器件结构导致更多隐藏故障引起的缺陷的位置。我们的新一代半导体分析工作流程可帮助您定位和表征影响量产、性能和可靠性的细微的电子问题。


Style Sheet for Komodo Tabs

Techniques

光学故障隔离

半导体制造中越来越复杂的设计使故障和缺陷隔离变得越来越复杂。光学故障隔离技术使您可以分析电活性设备的性能,以定位导致设备故障的关键缺陷。

了解更多 ›

电路编辑

先进的专用电路编辑和纳米原型设计解决方案将新型气体输送系统与广泛的化学品组合和聚焦离子束技术相结合,为半导体器件开发提供无与伦比的控制和精确度。

了解更多 ›

光学故障隔离

半导体制造中越来越复杂的设计使故障和缺陷隔离变得越来越复杂。光学故障隔离技术使您可以分析电活性设备的性能,以定位导致设备故障的关键缺陷。

了解更多 ›

电路编辑

先进的专用电路编辑和纳米原型设计解决方案将新型气体输送系统与广泛的化学品组合和聚焦离子束技术相结合,为半导体器件开发提供无与伦比的控制和精确度。

了解更多 ›

用于将 H2 样式更改为具有 em-h2-header 类 p 的样式表

Contact us

电子显微镜服务

为实现理想的系统性能,我们为您提供了由现场服务专家、技术支持部门和认证备件组成的全球网络支持。

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支持和服务页脚样式表
字体样式表
卡片样式表